一种具有多层ITO结构的高效屏蔽光学视窗  

A New Method for High EMC Reliability Optical Windows Design Consisting of Multi ITO Films

作　　者：陈瑞改[1] 吴育良[1] 孙晓平[1] 李曙新[1] 

机构地区：[1]深圳天马微电子股份有限公司,广东深圳518031

出　　处：《现代显示》2009年第7期30-32,62,共4页Advanced Display

摘　　要：针对现有屏蔽光学视窗透过率低、表面反射率高的缺点,提出一种高效屏蔽光学视窗的设计方法。即将ITO材料作为光学介质的一种,采用匹配的多层膜设计原理,将多层ITO匹配到减反膜系中,通过用Matlab语言对膜系进行仿真、优化,实现了反射率低于0.3%,透过率大于99%的光学性能,并通过特殊的结构把多层ITO连接在一起,实现高效电磁屏蔽性能。For most EMC techniques to achieve high RFI/EMI attenuation, the visible transmission is relatively low, and the reflection is unwanted high. This paper reference a new method for EMC optical windows design, based on immersing the multi ITO layers in a multi-layer AR coating designed to match the refractive index of the ITO, can reduce surface reflections to -0.3% average and the transmission beyond -99%. It is simulated by Matlab language. Rs values 〈5 /sq, can be achieved through getting multi ITO layers together. It will provide attenuations exceeding 70 dB.

关 键 词：电磁屏蔽 光学视窗 减反膜 优化 

分 类 号：TN141.9[电子电信—物理电子学]