R-C系统外遮光罩挡光环的程序化设计及锥状内遮光罩的改进  

Program design of outer baffle vanes and improvement of conical inner baffle in R-C system

作　　者：高郭鹏[1,2] 熊望娥[1] 甘玉泉[1,2] 刘阳[1,2] 

机构地区：[1]中国科学院西安光学精密机械研究所,陕西西安710119 [2]中国科学院研究生院,北京100039

出　　处：《应用光学》2009年第4期575-579,共5页Journal of Applied Optics

基　　金：国家重点基础研究发展计划(2009CB72405)

摘　　要：基于几何作图法推导出R-C系统外遮光罩内挡光环顶点的坐标公式,利用C语言编程实现程序化设计挡光环。在中心遮光比确定的情况下,推导出内遮光罩的顶点坐标公式,并将通常使用的主镜一级锥状遮光罩改进为二级锥状遮光罩,以高速摄影系统的R-C型折反式主物镜为例,对其主镜和次镜内遮光罩进行设计,并给出设计结果。当轴角为70°,遮光罩为二级和一级时,到达像面的杂散光照度分别为1.0823×10-12W/m2和1.6614×10-10W/m2,相差二个数量级,证明改进的二级遮光罩优于一级遮光罩,能有效抑制杂散光。最后,设计了主、次镜间镜筒内壁上等高挡光环,进一步抑制了R-C系统的杂散光。The vertex coordinate formulas for outer baffle vanes of R-C system are deduced based on geometrography, and the vanes are designed with C-language program. The vertex coordinate formulas of inner baffle are also deduced after assuring the central obscuration ratio, and then the common one-grade conical baffle is improved into the two-grade one. The correctness of baffle design is proved by an example and its simulated analysis, meanwhile an effective way of suppressing the stray light is provided. Finally, the same-height vanes in drawtube between primary and secondary mirrors are designed for further suppressing the stray light in R-C system.

关 键 词：R—C系统 杂散光 遮光罩 挡光环 

分 类 号：O439[机械工程—光学工程]