Ti(Ⅳ)在氯化物熔体中的电化学还原  

Electrochemical Reduction of Ti(Ⅳ) in Choride Melt

作　　者：杜继红[1] 祁和述 

机构地区：[1]西北有色金属研究院

出　　处：《稀有金属材料与工程》1998年第3期165-168,共4页Rare Metal Materials and Engineering

摘　　要：研究了ＫＣｌＬｉＣｌ熔体中Ｔｉ（Ⅳ）的电化学还原机理和钛沉积及沉积动力学，计算了各还原步骤传递的电子数。结果表明，Ｔｉ（Ⅳ）的电化学还原为三步电荷传递反应，即：Ｔｉ４＋→Ｔｉ３＋→Ｔｉ２＋→Ｔｉ。Ｔｉ（Ⅳ）的电化学还原速度由离子扩散速度来控制。在一定熔体组成及温度下，沉积物的性质依赖于电解时间及电解电位。在ＫＣｌＬｉＣｌ熔体中阴极电位为５００ｍＶ（相对钼电极），电解时间为４ｈ时，可获得粘附性能好的钛沉积物，并观察到沉积物为细小结晶堆积起来的多孔体。钛的纯度可达９９．９％。The mechanism of the cathode reduction of Ti(Ⅳ) and the kinetics of the electrodeposition and electrocrystallisation of titanium have been studied in KCl-LiCl melt. The transferred electron numbers of each reduction step were calculated. The results show that the electrochemical reduction of Ti(Ⅳ) proceeds on three steps of charge transfer:Ti(Ⅳ)→Ti(Ⅲ)→Ti(Ⅱ)→Ti(0),The electrochemical reduction rate of Ti(Ⅳ) is controlled by diffusion rate of ions.Under the conditions of constant temperature and composition of the melt, the nature of the deposit depends on the electrocrystallisation time and cathode potential. In KCl-LiCl melt a coherent Ti deposit can be obtained after electrocrystallisation for 4 hours at the cathode potential of500 mV (refered to Mo). And the Ti deposit constructed by fine crystals is porous, but the purity of the Ti deposit is 999%.

关 键 词：钛离子 电化学还原 氯化物熔体 炼钛 

分 类 号：TF823.04[冶金工程—有色金属冶金]