半导体行业含氟废水处理的研究  

Study on HF Wastewater Treatment of Semiconductor Industry

作　　者：童浩 

机构地区：[1]上海可瑞水技术有限公司,上海201203

出　　处：《环境科学与管理》2009年第7期75-77,82,共4页Environmental Science and Management

摘　　要：在过去几年，中国的半导体工业得到了迅速的发展，同时也带来了新的环境问题，其中尤以含氟废水的危害最为严重。文章详细介绍了某半导体企业含氟废水处理站，包括含氟废水的来源，危害，常用的处理方法，实验情况，本工程采用的工艺流程和运行情况等。实验数据和工程运行情况都证明，pH值为7．5—8．5时，以化学沉淀法和混凝沉淀法处理含氟废水效果最好。实践证明利用强酸强碱调节废水pH值后，采用CaCl2处理含氟废水，具有操作简便和处理费用低等优点，同时针对CaF2沉淀对处理设备的影响提出了有效措施。The China semiconductor industry is developed very fast in the past few years, it also result new environmental problem, especially for fluoride wastewater＇s hazard. The article introduces one semiconductor company fluoride wastewater treat- ment plant in detail ; include fluoride wastewater source, hazard, normal treatment process, jar - test, its wastewater treatment plant process and operation data etc. Data of jar - test ＆ operation have proved that pH 7.5 - 8. 5 is the best range for the method of chemical sedimentation and flocculation sedimentation. The operation of the engineering shows that operation is easy and in low running cost for HF wastewater treatment if pH is adjusted by dosing strong acid and strong alkali firstly, and then F iron settled by dosing CaCl2. Available measures are suggested to reduce the effect of CaF2 on the equipments.

关 键 词：半导体行业 含氟废水 化学沉淀法 混凝沉淀法 PH值 

分 类 号：X703.1[环境科学与工程—环境工程]