磁镜场在直接耦合式微波等离子体化学气相沉积金刚石膜制备装置中的应用  

Application of a Magnetic Mirror in Direct Coupler MPCVD Diamond Film Preparation Device

作　　者：杜康[1] 徐伟[1] 吴智量[1] 贺中信[1] 彭军[1] 

机构地区：[1]广州大学物理与电子工程学院,广东广州510006

出　　处：《真空电子技术》2009年第3期40-43,共4页Vacuum Electronics

基　　金：广州市属高校科技计划项目(62002)

摘　　要：在直接耦合式微波等离子体化学气相沉积金刚石膜装置的石英管反应腔加上磁镜场来更好地约束等离子体,使等离子体球成为"碟盘"状,提高了等离子体球的密度,在基本参数:反应压力2.5 kPa、基片温度450℃、气体流量为Ar:40sccm、CH4:4sccm、H2:60sccm不变的情况下,沉积面积直径由30 mm增长到50 mm,沉积速度由3.3μm/h增长到3.8μm/h,最大反射电流由15μA减小5μA。从而大大减少了在石英管壁和观察窗的沉积,有效利用微波能量电离出更多的活性基团沉积出高质量的(类)金刚石薄膜。In the direct coupled Microwave Plasma Chemical Vapor Deposition （MPCVD） diamond film device, a magnetic mirror is used upon quartz tube reaction chamber lens to better constraint plasma shape. So plasma ball becomes to ＂dish plate＂, the density of plasma ball is improved. The basic parameters： reactive pressure 2.5 kPa, slice temperature 450℃, gas flux Ar：40 sccm, CH4 ： 4 sccm, H2 ：60 sccm, which is constant, the diameter sedimentary area of growth from 30 mm to 50 mm, deposition rate increase from 3.3 μm/h to 3.8 μm/h, and the maximum reflected electric current reduce from 15 μA to 5 μA. Thus, deposition of the wall of quartz and the watching window are greatly reduced. The microwave energy is used effectively to made high quality diamond films or diamond like carbon films.

关 键 词：微波等离子体 化学气相沉积 金刚石膜 磁镜场 

分 类 号：O484[理学—固体物理]