等离子体与等离子体隐身技术  

Plasma and Plasma Stealth Technology

作　　者：潘文俊[1] 童创明[1] 周明[1] 

机构地区：[1]空军工程大学导弹学院,陕西三原713800

出　　处：《电讯技术》2009年第8期108-112,共5页Telecommunication Engineering

摘　　要：等离子体隐身技术是一种新型的隐身技术,是雷达隐身技术的最新发展。介绍了等离子体的产生方法,讨论了等离子体的隐身机理,阐述了国内外等离子体隐身技术的研究进展。针对目前难以产生性能稳定的等离子体以及在目标表面难以形成持续均匀的等离子体层等技术难点,介绍了两种最新的改进措施,最后对等离子体隐身技术的发展前景进行了展望。Plasma stealth is a novel type of stealth technology and the latest development of radar stealty technology. In this paper,the method of plasma preparation is introduced,the stealth mechanism is discussed, and the research progresses at home and abroad are summarized. Aiming at such difficulty,as generating steady performance plasma and continuous plasma layer on the target surface,two latest improved methods are introduced. Finally the prospective views are analyzed.

关 键 词：等离子体 隐身技术 发展现状 

分 类 号：TN97[电子电信—信号与信息处理] O441.4[电子电信—信息与通信工程]