紫外光照射下冶金级硅湿法提纯工艺研究  

Hydrometallurgical Purification of Metallurgical-Grade Silicon under the Ultraviolet Radiation

作　　者：李阳[1] 张倩[1] 赵杰[1] 汤培平[1] 徐敏[1] 

机构地区：[1]厦门大学化学工程与生物工程系,福建厦门361005

出　　处：《江苏理工学院学报》2009年第2期14-17,共4页Journal of Jiangsu University of Technology

摘　　要：实验研究了40W紫外光照射下湿法酸洗提纯冶金级硅后,Al、Fe两种主要金属杂质的含量变化,并与普通无光照实验进行了对比分析。采用EMPA、ICP对纯化产品进行表征。实验结果表明,在相同反应时间下,以非氧化性酸和HF酸作为酸洗液,紫外光照射下Fe和Al的残留量比无光照条件下分别减少了41%和16.4%,纯度已接近无紫外光照下利用氧化性酸和HF酸酸洗的结果。同时发现以氧化性酸和HF酸作为酸洗液,紫外光照射下Fe和Al的残留量比无光照条件下也有明显下降,所降程度根据不同氧化性酸酸洗液而不同。Metalhrgical-Grade Silicon has been purified by acid agents such as HCl, HF, and HN03 under ultraviolet radiation in this experiment. The change of impurity content in Fe and A1 has been re- searched, which is compared with that of hydrometallurgical purification without ultraviolet radiation. The experimental results Show that even without assistant of ox/dative acids, the removal ratio of the main impurities Fe and A1 are increased by 41% and 16.4% respectively under ultraviolet radiation, and its purity has already approached to that of leached by oxidative acids and HF. In this paper, influ- ence of different kinds of acids on concentration of the main impurities is also researched under ultraviolet radiation.

关 键 词：太阳能硅 紫外光 湿法提纯 冶金级硅 

分 类 号：TF111.3[冶金工程—冶金物理化学]