X射线在金属表面产生Compton电流引起的电磁辐射时空分布  

Electromagnetic radiation of X-ray-induced Compton current on metal surface

作　　者：陈实[1] 蒋吉昊[1] 李剑峰[1] 

机构地区：[1]中国工程物理研究院流体物理研究所,四川绵阳621900

出　　处：《强激光与粒子束》2009年第9期1411-1414,共4页High Power Laser and Particle Beams

摘　　要：研究了强X射线在金属表面产生的Compton电流时空分布,利用Compton散射公式计算了出射电子动量和微分散射截面随电子出射角的变化关系,发现在光子能量为1 MeV、入射光强为1021W.m-2的条件下,沿入射光方向形成的Compton电流密度达到107A.m-2量级。采用1维电动力学模型计算了斜入射的X射线在金属表面产生的Compton电流密度引起的电磁脉冲,结果表明:X射线在单位长度金属辐射产生的磁场强度达到106A.m-1量级,脉冲宽度为ps量级;电磁脉冲沿X射线反射方向传播,具有良好的定向性。Obliquely-incident X ray photons interacting with metal through Compton scattering can produce a large current density along the metal surface in the incidcnl direction. In this paper, angular distributions of scattered electron momentum and differential cross section were calculated. The results show that for photon energy of 1 MeV and X-ray intensity up to 10^21 W·m^-2, the Compton current dcnsily on the metal surface is as large as 10^7 A·m^-2, The electromagnetic pulse caused by this current was calculated using a one dimensional electrodynamic model. It is found that radiated magnetic field per unit length of metal is derived with the magnilude of 10^6 A·m^-2and the duration of picoseconds. The emitted electromagnetic radiation is well-directed, propagating mainly in the specular direction.

关 键 词：X射线 COMPTON散射 电磁辐射 电流密度 辐射场 

分 类 号：O434.14[机械工程—光学工程]