高玻璃化温度化学增幅光致抗蚀剂的制备  

PREPARATION OF WATER BASED NEGATIVE CHEMICAL AMPLIFIED PHOTORESIST WITH HIGH GLASS TRANSITION TEMPERATURE

作　　者：王慧[1] 游凤祥[1] 陈明[1] 李元昌[1] 卢建平[1] 洪啸吟[1] 黄志齐 胡德甫 

机构地区：[1]清华大学化学系 [2]北京化学试剂所

出　　处：《感光科学与光化学》1998年第3期245-249,共5页Photographic Science and Photochemistry

基　　金：国家自然科学基金

摘　　要：本文合成了一种具有高玻璃化温度的苯乙烯和Ｎ－（４－羟基苯基）马来酰亚胺的共聚体，并将其应用于紫外负性水型化学增幅抗蚀剂中，并初步确定了该光致抗蚀剂的光刻工艺操作条件，得到了分辨率为１．３９μｍ的光刻图形．A water based near UV negative chemical amplified photoresist was developed,consisting of styrene co N (4 hydroxyphenyl)maleimide with high glass transition temperature (Tg), hexamethoxymethylmelamine (HMMM) triphenyl sulfonium salt.The conditions of photolithograpy process were preliminarily defined.Based on our research,the pattern with 1.39 μm lines and spaces was obtained by the conventional UV photolithography under the optimum parameters.

关 键 词：光致抗蚀剂 光刻 化学增幅 抗蚀剂 合成 

分 类 号：TN305.7[电子电信—物理电子学]