电感耦合等离子体原子发射光谱法测定沉钒浸出液中钒、磷、硅、钾、钠  

Determination of vanadium,phosphorus,silicon,kalium and sodium in immersion vanadium solution by inductively coupled plasma atomic emission spectrometry

作　　者：杨新能 蒋厚英 宋春霞 冯宗平 

机构地区：[1]攀钢集团攀枝花钢钒有限公司,四川攀枝花617000

出　　处：《冶金标准化与质量》2009年第5期24-26,共3页Metallurgical Standardization & Quality

摘　　要：采用电感耦合等离子体原子发射光谱法(ICP-AES)测定高盐分的沉钒浸出液中 V、Si、P、K 和 Na 等元素。对各元素的波长、高频发生器的功率、蠕动泵速度、雾化器压力、辅气流量和观测高度等分析条件进行了讨论。各元素校准曲线的线性关系良好,检出限在0.000 3～0.042 g/L 之间。在仪器最佳工作条件下,方法的回收率在98%～106%之间,相对标准偏差均小于4.08%。该法分析周期短,分析结果与其他常规检测方法相吻合,适用于大批量日常生产检测。The elements in immersion vanadium solution including vanadium, phosphorus, silicon, kalium and sodium were determined by inductively coupled plasma atomic emission spectrometry （ICP-AES）. The effects of element wavelength, high-frequency generator power, the speed of peristaltic pump, nebulizer pressure, auxiliary gas flow rate and observation height analysis were discussed. Linearity for calibration curve of elements in this method was good, and detection limits was 0.000 3 ～ 0.042 g/L. Under the optimal working conditions of instrument, the recovery of this method was 98%～106%, and the relative standard deviation was less than 4.08%. The analytical time of this method was short, the determination results with this method were in good agreement with the results by other conventional determine methods, and it was suitable for the routine produce inspection.

关 键 词：电感耦合等离子体光谱法 沉钒浸出液 高盐试样 钒 磷 钠 

分 类 号：TG115.33[金属学及工艺—物理冶金]