感耦等离子体发射光谱/质谱分析新型陶瓷材料研究进展  

The Application of Inductively Coupled Plasma Atomic Emission Spectrometry/Mass Spectrometry to the Analysis of Advanced Ceramic Materials

作　　者：汪正[1] 王士维[1] 邱德仁[2] 杨芃原[2] 

机构地区：[1]中国科学院上海硅酸盐研究所,上海200050 [2]复旦大学化学系,上海200433

出　　处：《光谱学与光谱分析》2009年第10期2838-2842,共5页Spectroscopy and Spectral Analysis

基　　金：国家自然科学基金项目(20705036);中国科学院上海硅酸盐所科技创新项目(SCX0626);科技部"863"计划项目(2006AA03Z535)资助

摘　　要：新型陶瓷材料在信息、航空航天、生命科学等现代科学技术各个领域中发挥了极其重要的作用。微量、痕量杂质对材料的光、电等性能影响巨大。因此微量、痕量杂质含量的精确测定对材料制备和性能调控至关重要。文章综述了近10年来等离子体发射光谱/质谱(ICP-AES/MS)在新型陶瓷材料的微、痕量杂质分析方面的应用。结合作者的研究工作,着重介绍和评论了等离子体发射光谱/质谱各种进样方法的优缺点,并展望其发展趋势。Advanced ceramics have been applied to various important fields such as information science, aeronautics and astronautics, and life sciences. However, the optics and electric properties of ceramics are significantly affected by the micro and trace impurities existing in the material even at very low concentration level Thus, the accurate determination of impurities is important for materials preparation and performance. Methodology of the analysis of advanced ceramic materials using ICP-AES/MS was reviewed in the present paper for the past decade. Various techniques of sample introduction, especially advances in the authors＇ recent work, are described in detail. The developing trend is also presented. Sixty references are cited.

关 键 词：新型陶瓷材料 等离子体发射光谱/质谱 综述 

分 类 号：O657.3[理学—分析化学]