射频磁控溅射法制备聚氟薄膜及其性能研究  

Preparation and Performance Study of Polyfluorin Thin Film by Radio Frequency Magnetron Sputtering Method

作　　者：高原[1,2] 秦晓刚[2] 郭云[2] 刘惠涛[1] 

机构地区：[1]烟台大学化学生物理工学院,山东烟台264005 [2]中国空间技术研究院兰州物理所真空低温技术与物理国家级重点实验室,兰州730000

出　　处：《航空材料学报》2009年第5期61-65,共5页Journal of Aeronautical Materials

基　　金：真空低温技术与物理国家级重点实验室基金资助项目(9140C550201060C55)

摘　　要：研究了卫星相控阵雷达天线系统的TR组件表面聚氟材料薄膜的制备工艺,采用射频磁控溅射法成功地在TR组件表面制备了聚氟薄膜,并对所制备的薄膜进行了电子二次倍增效应阈值试验。结果表明,聚氟薄膜不但具有良好的绝缘性能,且其二次电子发射也较低,提高了电子二次倍增效应阈值。对薄膜组分与形貌进行了X射线光电子能谱(XPS)和扫描电子显微镜(SEM)分析表征,薄膜较好的保持了聚氟材料的特性,其均匀性和致密性均达到了实际应用要求。The preparation technics of polyfluorin thin film on the surface of TR groupware of antenna system of satellite phased array radar is investigated. Polyfluorin thin film is successfully prepared using radio frequency magnetron sputtering method on the surface of TR groupware. The results of electron muhipacting effect threshold experiments show that the polyfluorin thin film not only has good insulation capability hut also possesses lower secondary electron emission yield, and the electron multipacting effect threshold is improved. XPS and SEM results show that the thin film keeps the property of polyfluorin material well and its uniformity and compactness is capable for practical application.

关 键 词：聚氟材料 射频磁控溅射 电子二次倍增效应 

分 类 号：TQ325.4[化学工程—合成树脂塑料工业]