强磁场对真空蒸镀制取Te薄膜的影响  

Effect of high magnetic field on Te films prepared by vacuum evaporation

作　　者：赵安昆[1] 任忠鸣[1] 任树洋[1] 操光辉[1] 任维丽[1] 

机构地区：[1]上海大学材料科学与工程学院,上海200072

出　　处：《物理学报》2009年第10期7101-7107,共7页Acta Physica Sinica

基　　金：国家自然科学基金(批准号:50671060)资助的课题~~

摘　　要：采用强磁场下物理气相沉积方法,在单晶硅、玻璃板和聚乙烯(PET)基片上真空蒸发制取Te膜.结果显示在三种不同的基片上生长Te膜时,4T强磁场能够加快Te膜的形核长大,增大Te膜的颗粒尺度,使晶粒〈011〉方向取向性增强.Thin film of tellurium was prepared by vacuum evaporation deposition on glass,polyethylene foils and Si under high magnetic field.The results show that the difference of the substrate can strongly affect the particle size,and a magnetic flux density of 4 T can accelerate the speed of growth of Te film,increase the particle size and the intensity of（011）peak of Te films.

关 键 词：真空蒸镀 强磁场 晶面取向 Te薄膜 

分 类 号：O484.1[理学—固体物理]