基于MHD的磁射流抛光中流场的分析与模拟  

Analysis and simulation of flow field in magnetorheological jet polishing by MHD

作　　者：施春燕[1,2] 伍凡[1] 袁家虎[1] 万勇建[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209 [2]中科院研究生院,北京100049

出　　处：《光学技术》2009年第5期736-738,741,共4页Optical Technique

摘　　要：从理论上分析了磁射流抛光中的磁场与流场的相互作用,构建了磁射流抛光的冲击射流模型,基于磁流体动力学对磁射流抛光过程的紊动冲击射流进行数值模拟,得到了磁射流抛光过程的连续流场和射流在工件壁面上的压力、速度、紊动强度分布。通过比较射流抛光和磁射流抛光的数值计算结果,分析了磁流变效应对射流稳定性的影响,从射流的流场、速度、紊动强度等方面分析射流在磁场中稳定的原因。In magnetorheological jet polishing（MJP）,by analyzing the mutual action between flow field and magnetic field in magnetorheological jet polishing,physical model of the magnetorheological jet polishing system is established,and the turbulent impinging jet in magnetorheological jet polishing process is simulated by magnetohydrodynamics.Then the continuity fluid field of magnetorheological jet polishing and the distribution of pressure,velocity,turbulent intensity on the wall of work piece are got.Based on the comparison between fluid jet polishing and magnetorheological jet polishing,how the magnetorheological effect acts the stability of jet is analyzed,and the reason of stability in magnetic field from the aspects of flow field,velocity and turbulent intensity is explained.

关 键 词：磁射流抛光 磁流体动力学(MHD) 流场 

分 类 号：TP161[自动化与计算机技术—控制理论与控制工程]