镍锰合金的电沉积行为  

Electrodeposition Behavior of Nickel-Manganese Alloy

作　　者：潘秉锁[1,2] 牛明远[2] 方小红[2] 

机构地区：[1]教育部岩土钻掘与防护工程研究中心,湖北武汉430074 [2]中国地质大学工程学院,湖北武汉430074

出　　处：《材料保护》2009年第10期1-3,共3页Materials Protection

摘　　要：为了了解镍锰合金沉积的电极过程,采用线性扫描伏安法、单电位阶跃计时电流法和交流阻抗谱技术对镍锰合金的电沉积与镍的电沉积进行了对比性研究。结果表明:氯化锰的加入增大了阴极极化;镍和镍锰合金的电结晶都与三维连续成核理论相吻合,但加入氯化锰后电结晶成核速率常数增大,晶体向外生长速度和镍离子的扩散系数下降;电荷传递电阻增大,双电层电容下降。这些变化可能都与Mn(OH)2在阴极表面的吸附有关。Linear sweep voltammetry,single-potential step chronoamperometry and alternating current impedance spectroscopy were employed to comparatively study the electrodeposition behavior of Ni-Mn alloy and pure nickel so as to understand the cathodic process of nickel electrodeposit.Results show that the addition of MnCl2 enhances the cathodic polarization.The electrocrystallization of both nickel and Ni-Mn alloy followed progressive three dimensional nucleation and growth mechanism.At the same time,the introduction of MnCl2 contributed to increased nucleation rate constant and charge transfer resistance, and decreased outward growth rate of crysta,diffusion coefficient of Ni2+ and capacitance of electric double layer.This might be resulted from the adsorption of Mn(OH)2 on cathode surface.

关 键 词：电沉积 镍锰合金 成核机理 阴极过程 

分 类 号：TQ153.2[化学工程—电化学工业]