非晶态Nb氧化物纳米薄膜可见光区的光致发光  

Photoluminescence of Amorphous Niobium Oxide Film in Visible Light Area

作　　者：陶淑芬[1] 周效锋[1] 

机构地区：[1]云南曲靖师范学院物理系,云南曲靖655000

出　　处：《光学学报》2009年第10期2934-2937,共4页Acta Optica Sinica

基　　金：国家自然科学基金(59671013);云南省自然科学基金(2005A0080m-2)资助课题

摘　　要：在低真空及亚高温(200～300℃)下,通过热氧化法在Si单晶基底上合成了呈准直阵列的椎形结构的氧化铌(NbOx)非晶结构纳米薄膜,薄膜经热处理后室温下在可见光区具有很好的光致发光。实验研究了退火温度与发光强度规律,对铌氧化物纳米薄膜的光致发光(PL)机制进行了初步分析和讨论。变功率光致发光(PL)实验有力地支持了初步讨论结果。Niobium oxide amorphous films were deposited on silicon substrates at temperatures ranging from 200-300 ℃ by heating a pure niobium foil in a rough vacuum. The films were amorphous in structure and with morphology of vertically aligned nanocolumniations. This structure after anealing is of interesting photoluminescence property in the visible light range. The curve of emission intensity with annealing temperature of films was given. The mechanism for this photoluminescence （PL） behavior of the amorphous niobium oxide films was also investigated and discussed;the changed power PL experiment having supported the result forcefully.

关 键 词：材料 光致发光 热氧化法 Nb氧化物薄膜 非晶纳米材料 

分 类 号：O482.3[理学—固体物理]