纳米TiO_2薄膜的制备及其光谱特性研究  

Preparation of Nanocrystalline TiO_2 Thin Film and Study of Its Spectral Ability

作　　者：郝丽媛[1] 周炳卿[1] 韩兵[1] 陈霞[1] 李力猛[1] 那日苏[1] 王丽娟[1] 

机构地区：[1]内蒙古师范大学物理与电子信息学院,功能材料物理与化学自治区重点实验室,呼和浩特010022

出　　处：《信息记录材料》2009年第5期17-22,共6页Information Recording Materials

基　　金：国家自然科学基金资助项目(50662003)

摘　　要：采用溶胶凝胶法和旋转涂膜工艺,以普通玻璃为衬底,制备均匀、透明的TiO2纳米薄膜。利用X射线衍射仪(XRD)、原子力显微镜(AFM)和紫外可见光谱(UV/vis)对TiO2进行表征。通过500℃、600℃、700℃、800℃和900℃恒温烧结2h后XRD测试表明:经500°C退火得到TiO2粉末为锐钛矿晶相,800℃转化为金红石相结构,900℃出现了金红石相与板钛矿相的混合晶相。通过AFM观测,薄膜的平均粗糙度为1.71nm。通过紫外可见光谱分析,探讨了影响TiO2纳米膜厚度和禁带宽度度的各种因素。结果表明:涂膜次数、热处理温度等将直接影响二氧化钛薄膜的紫外可见光谱和禁带宽度。The uniform transparent nanocrystalline TiO2 thin films were prepared on glass substrate by sol-gel method. The nanostructure TiO2 were characterized by XRD,AFM and UV-VIS spectra. The Structure of TiO2 powders was investigated by X-ray diffraction after heating treatment in 500℃.600℃,700℃.800℃ and 900℃. The results show that the crystalline phase is anatase in 500℃ ,rutile in 800℃ and the composite phase structure of rutile and Brookit in 900℃ . the films roughness average is 1.71 nm by AFM. The thickness and the bandgap of nanocrystalline TiO2 thin films were calculated by using the UV-Vis spectra. The results show that aging time,heat treatment and dip coating times would affect the UV-Vis spectra and the bandgap of TiO2 thin films.

关 键 词：TiO2纳米膜 溶胶-凝胶法 XRD 紫外-可见光谱 

分 类 号：O612.4[理学—无机化学]