A selective area growth double stack active layer electroabsorption modulator integrated with a distributed feedback laser  

作　　者：ZHU HongLiang LIANG Song ZHAO Ling Juan KONG DuanHua ZHU NingHua WANG Wei 

机构地区：[1]Key Laboratory of Semiconductor Materials, Institute of Semiconductor, Chinese Academy of Sciences, Beijing 100083, China

出　　处：《Chinese Science Bulletin》2009年第20期3627-3632,共6页

基　　金：Supported by the National High-Tech Research and Development Program of China (Grant Nos.2001AA312050,2005AA31g060 and 2007AA-03Z417)

摘　　要：A new method for fabricating electroabsorption modulator integrated with a distributed feedback laser(EML) was proposed.With the method we fabricated a selective area growth double stack active layer EML(SAG-DSAL-EML).Through comparing with other fabrication methods of EMLs,the characters and the merits of the new method presented in this paper were discussed.A new method for fabricating electroabsorption modulator integrated with a distributed feedback laser （EML） was proposed, With the method we fabricated a selective area growth double stack active layer EML （SAG-DSAL-EML）, Through comparing with other fabrication methods of EMLs, the characters and the merits of the new method presented in this paper were discussed.

关 键 词：分布反馈激光器 电吸收调制器 选择区域生长 有源层 集成 堆积 EML 制备方法 

分 类 号：TN248.4[电子电信—物理电子学] TN929.11