轫致辐射X光源初步研究  

Bremsstrahlung mechanism application on mini X-ray source

作　　者：顾小冯[1] 罗小为[1,2] 戴建枰[1] 

机构地区：[1]中国科学院高能物理研究所,北京100049 [2]中国科学技术大学同步辐射实验室,合肥230027

出　　处：《核技术》2009年第11期806-812,共7页Nuclear Techniques

摘　　要：对高能电子打薄靶和低能电子打厚靶两种不同轫致辐射方式的微型轫致辐射光源进行了研究。推导并比较了两种方式的单位电子光子产生率,给出了提高光子产额的方法。以BFEL直线加速器为平台,利用高能电子薄靶的轫致辐射光进行X光成像实验,研究薄靶对电子束流参数的影响,并对轫致辐射微型X光源的特性进行了讨论。Recently, increasing research effort have been made on mini X-ray sources, which are of small size with high quality and low cost. Among them, a mini X-ray source based on bremsstrahlung is of better perspective. In this paper, we report our work on two kinds of bremsstrahlung mechanisms for mini X-ray sources. The photon production per electron of the X-ray production mechanisms are deduced and compared, so as to find the ways to improve them. Experiment on X-ray imaging with thin target bremsstrahlung was carried out to study the imaging quality and the influence on electron beam for the mini X-ray sources.

关 键 词：微型X光源 轫致辐射 光子产额 光子产生率 

分 类 号：O57[理学—粒子物理与原子核物理]