Structure and Properties of Ti-Si-N Coatings Synthesized by Combining Cathode Arc and Middle-frequency Magnetron Sputtering  被引量:2

Structure and Properties of Ti-Si-N Coatings Synthesized by Combining Cathode Arc and Middle-frequency Magnetron Sputtering

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作  者:杨种田 付德君 

机构地区:[1]College of Science, China Three Gorges University [2]Accelerator Laboratory and Key Laboratory of Acoustic and Photonic, Materials and Devices of Ministry of Education, Wuhan University

出  处:《Journal of Wuhan University of Technology(Materials Science)》2009年第5期702-705,共4页武汉理工大学学报(材料科学英文版)

基  金:Funded by the Natural Science Foundation of China(No.10435060 andNo. 10675095)

摘  要:Ti-Si-N composite coatings were synthesized on a novel combining cathode and middle-frequency magnetron sputtering system, designed on an industrial scale. Ti was produced from the arc target and Si from magnetron target during deposition. The influences of negative bias voltage and Si content on the hardness and microstructure of the coatings were investigated. The composite coatings prepared under optimized conditions were characterized to be nc-TiN/a-Si3N4 structure with grain sizes of TiN ranging from 8-15 nm and exhibited a high hardness of 40 GPa. The enhancement of the hardness is suggested to be caused by the nanograin-amorphous structure effects.Ti-Si-N composite coatings were synthesized on a novel combining cathode and middle-frequency magnetron sputtering system, designed on an industrial scale. Ti was produced from the arc target and Si from magnetron target during deposition. The influences of negative bias voltage and Si content on the hardness and microstructure of the coatings were investigated. The composite coatings prepared under optimized conditions were characterized to be nc-TiN/a-Si3N4 structure with grain sizes of TiN ranging from 8-15 nm and exhibited a high hardness of 40 GPa. The enhancement of the hardness is suggested to be caused by the nanograin-amorphous structure effects.

关 键 词:Ti-Si-N composite coatings cathode assisted middle-frequency magnetron sputtering hardness structure 

分 类 号:TG174.4[金属学及工艺—金属表面处理]

 

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