用拉伸和二次曝光法制作基于莫阿光纤光栅的带通滤波器  

BANDPASS FILTER BASED ON A MOIRE IN FIBER BRAGG GRATING WITH A STRETCH AND DOUBLE EXPOSURE METHOD

作　　者：周凯明[1] 安贵仁[1] 葛璜[1] 王圩[1] 

机构地区：[1]中国科学院半导体所国家光电子工艺中心

出　　处：《光子学报》1998年第9期828-832,共5页Acta Photonica Sinica

摘　　要：我们利用一块均匀掩膜版，通过对光纤拉伸和二次紫外曝光的方法制作了一基于莫阿－布喇格光纤光栅的带通滤波器，其带通宽度为０．２８ｎｍ．我们对这种方法制作的莫阿－布喇格光栅作了理论分析．在此文中，还给出了均匀光纤光栅的拉伸特性．Using a uniform phase mask,a bandpass filter based on Moire Bragg grating in fiber is fabricated through a stretch and double exposure method.The bandpass width is 0.28nm.A theoretical analysis about the Moire grating so made is given.It is also measured the characteristics of a uniform Bragg grating.

关 键 词：光纤光栅 带通滤波器 二次曝光 拉伸特性 

分 类 号：TN256[电子电信—物理电子学]