TiNi形状记忆合金薄膜的位借与相变  

Dislocation and Phase Transformation in Thin Films of the Shape Memory Alloy TiNi

作　　者：单凤兰[1] 霍艳玲[1] 滕凤恩[1] 王煜明[1] 

机构地区：[1]吉林大学

出　　处：《稀有金属材料与工程》1998年第4期199-201,共3页Rare Metal Materials and Engineering

摘　　要：用Ｘ射线衍射线形的傅里叶分析及电阻法，研究了溅射Ｔｉ－４９．３７ａｔ％Ｎｉ合金薄膜的位错组态及相转变温度随退火条件的变化规律，以及位错密度与相变温度的关系。研究结果表明：随退火温度升高和保温时间增加，平均位错密度下降，马氏体相变温度升高。位错密度的变化受析出相粒子的大小和分布制约。随位错密度增加，马氏体相变温度下降，Ｒ相变温度基本保持不变。Xray diffraction profile Fourier analysis and electrical resistivity have been used to study the variation of the dislocation configuration and the phase transformation temporature with annealing condition in sputtered Ti4937 at% Ni thin films. The relationship between dislocation density and phase transformation temperature has also been studied. It has been found that the average dislocation density decreases and the martensitic transformation temperature increases with increase of annealing temperature and (or) the prolongation of the annealing time. The dislocation density is affected by the size and distribution of precipitates. The martensitic transformation temperature decreases and the Rphase transformation temperature is relatively unchanged as the dislocation density increases.

关 键 词：薄膜 位错 相变 形状记忆合金 

分 类 号：TG139.6[一般工业技术—材料科学与工程] O484[金属学及工艺—合金]