电子束蒸发法制备掺钇稳定氧化锆薄膜的光学特性研究  

Optical Properties of Electron Beam Evaporated Y-Doped ZrO_2 Films

作　　者：李朝阳[1,2] 邢光建[3] 杨永军 赵俭 陈强[2] 

机构地区：[1]中国科学院理化技术研究所,激光物理与技术中心,北京100190 [2]北京印刷学院等离子体实验室,北京102600 [3]北京石油化工学院材料科学与工程系,北京102617 [4]中国一航北京长城测量技术研究所,北京100095

出　　处：《真空科学与技术学报》2009年第6期673-677,共5页Chinese Journal of Vacuum Science and Technology

基　　金：北京市教委科技面上发展项目(KM200710015002);航空科学基金项目(2008ZD44007)

摘　　要：利用电子束蒸镀方法在单晶硅和石英玻璃上制备了掺不同Y2O3浓度的掺钇稳定ZrO2薄膜(YSZ),用X射线衍射、原子力显微镜、扫描电子显微镜和透射光谱测定薄膜的结构、表面特性和光学性能,研究了退火对薄膜结构和光学性能的影响。结果表明:一定浓度的Y2O3掺杂可以使ZrO2薄膜稳定在四方相,退火显著影响薄膜结构,随着温度的升高薄膜结构依次经历由非晶到四方相再到四方和单斜混合相转变;AFM分析显示薄膜表面YSZ颗粒随着退火温度的升高逐渐增大,表面粗糙度相应增大,晶粒大小计算表明,退火温度的提高有助于薄膜的结晶化,退火温度从400℃到1100℃变化范围内晶粒大小从15.6nm增大到46.3nm;同时利用纳秒激光对薄膜进行了破坏阈值测量,结果表明电子束蒸镀制备YSZ薄膜是一种制备高抗激光损伤镀层的有效方法。The ZrO2 films, doped with different contents of 3（203, were grown by electron beam evaporation. Its microstructures and optical propertied were characterized with X-ray diffraction （XRD）, scanning electron microscopy （SEM） ,and atomic force microscopy （AFM）.The influence of the film growth conditions on its properties was studied. The results show that the annealing temperature strongly affects the microstructures of the ZrO2 films stabilized with proper Y2O3, content. For instance, as the temperature rises up, the amorphous phase of ZrO2 changes into tetragonal phase, ending up with a monoclinic phase; and the grain sizes also inerease, roughening the film surfaces. The pulsed, nano-second laser irradiation little affects the surface morphology of the ZrO2 films, which can be a promising anti damage material.

关 键 词：YSZ薄膜 退火 表面粗糙度 激光破坏阈值 

分 类 号：TB383[一般工业技术—材料科学与工程] O484.1[理学—固体物理]