喷射成形二级结构雾化器的雾化过程数值模拟  

Numerical simulation of atomizing process for spray deposition double-decked atomizer

作　　者：曲迎东[1] 古元军[1] 叶正涛[1] 李荣德[1] 袁晓光[1] 李润霞[1] 

机构地区：[1]沈阳工业大学材料科学与工程学院,沈阳110870

出　　处：《沈阳工业大学学报》2009年第5期508-511,535,共5页Journal of Shenyang University of Technology

基　　金：国家自然科学基金资助项目(50605045);辽宁省创新团队资助项目(2007T131);沈阳市科学技术基金资助项目(1081229-1-00)

摘　　要：针对新设计的二级结构雾化器的雾化过程进行了数值模拟.利用Fluent软件,模拟了不同压强条件下气体流场的速度、压强分布及弥散相的分布情况,并进行了实验验证.数值模拟结果表明:当主雾化器的压强为1MPa、辅助雾化器的压强为0.5MPa时,主雾化器雾化区域的气流速度能达到300m/s,弥散相分布对称,靠近雾化轴部分弥散相密度较大,模拟结果与实验结果基本一致,表明新设计的二级结构雾化器在喷射工艺中能够取得较好的雾化效果.The numerical simulation of atomizing process for a new developed double-decked atomizer was performed. The velocity and pressure distribution of the gas flow field under different pressure as well as the distribution of the dispersed phase were simulated with using Fluent software. Furthermore, the simulation result was experimentally verified. The simulation result shows that when the pressure of main atomizer is 1 MPa and the pressure of auxiliary atomizer is 0. 5 MPa, the velocity Of the atomized gas in the atomizing region can reach 300 m/s, and the distribution of the dispersed phase is symmetrical. The simulation result is consistent with the experimental one. It means that the new developed double-decked atomizer has the satisfied atomization effect.

关 键 词：喷射成形 二级结构 雾化器 雾化过程 数值模拟 压力场 速度场 沉积坯 

分 类 号：TG249.9[金属学及工艺—铸造]