真空电弧离子镀ZrN涂层的工艺与性能  

Process and Property of the ZrN Coating Made by Vacuum Arc Ion Plating

作　　者：董超苏[1,2] 邱万奇[1] 代明江[2] 林松盛[2] 

机构地区：[1]华南理工大学材料与工程学院,广东广州510651 [2]广州有色金属研究院,广东广州510651

出　　处：《新技术新工艺》2009年第11期87-89,共3页New Technology & New Process

摘　　要：采用真空阴极电弧离子镀在不同基体材料上镀ZrN涂层,试验研究了ZrN薄膜的沉积工艺与性能,分析了基体偏压和沉积真空度对ZrN薄膜显微结构与性能的影响。XRD结果表明,随着偏压升高和炉底真空度的降低,ZrN(111)衍射峰逐渐增强,而(200)衍射峰逐渐减弱;炉底真空度降低,试样表面液滴状况明显变好。In this paper, the ZrN coating is plated on different substrates by the method of vacuum arc ion plating, and the deposition technology and property of ZrN coating are researched by experiment. Influences of substrate bias voltage and depositing vacuum degree on the microstructure and property of ZrN coating are analyzed. The XRD result shows that with the bias voltage increasing and hearth vacuum degree decreasing, ZrN （111） diffractive apex enhances gradually, but （200） diffractive apex abates gradually. And the situation of samples surface droplet gets better when the hearth vacuum degree decreasing.

关 键 词：ZrN薄膜 真空电弧离子镀 工艺 性能 

分 类 号：TG174.2[金属学及工艺—金属表面处理]