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机构地区:[1]武汉理工大学硅酸盐材料工程教育部重点实验室,武汉430070 [2]武汉理工大学机电学院,武汉430070
出 处:《武汉理工大学学报》2009年第22期63-65,70,共4页Journal of Wuhan University of Technology
基 金:湖北省科技攻关项目(2007AA101C25)
摘 要:在玻璃退火温度范围内,对钠钙硅酸盐平板玻璃施加高压电场。研究了高压电场下处理温度、时间、电场强度及泄露电流对玻璃化学稳定性的影响。利用化学滴定法测试了玻璃表面析碱量,研究了玻璃的耐水性。利用恒温恒湿箱进行了加速风化实验,采用XJZ-6型金相显微镜观察玻璃样品风化后的形貌。实验表明,泄露电流强度不大于150μA/cm2时,高压电场提高正极附近玻璃表面(空气面)的化学稳定性,同时负极附近玻璃表面(渗锡面)的化学稳定性变化不大。The soda-lime silicate float glass is imposed to high voltage electrostatic field at the annealing temperature range of the glass. The influences of the leakage current intensity, processing temperature and time on the chemical stability of glass under high-voltage electrostatic field are researched. The use of chemical titration analysis tested alkali of glass surface to re.search the hydrolytic resistance of glad. The glass samples accelerated weathering tests are carried out using constant temperature and humidity chamber, and the glass microscope morphology after weathering is observed by metallographie microscope XJZ-6. The experimental results show that when leakage current strength is lower than 150μA/cm2, with increase of the high voltage dectrostatic field, the chemical stability (hydrolytic resistance) of the glass surface near the cathode surface (air side) increases, and little change is found in that of the side (tin permeability surface).
分 类 号:TB321[一般工业技术—材料科学与工程]
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