掺杂钨丝电沉积铬的工艺研究  

Process Study on Chromium Electrodeposition on Adulterate Tungsten Filament

作　　者：严敏杰[1] 

机构地区：[1]上海工程技术大学材料工程学院,上海201620

出　　处：《表面技术》2009年第6期57-59,共3页Surface Technology

基　　金：上海市科委攻关项目资助(08520513400);上海市重点学科建设项目资助(J51402)

摘　　要：为了研究掺杂钨丝（真空镀铬加热元件）表面电解沉积一定厚度（≥100μm）金属铬的工艺，详细考察了不同温度、电流密度、沉积时间等对镀层的影响，并对镀层进行了性能测试。结果表明，最佳工艺条件为：铬酐150—180μg／L，硫酸1．5～1．8g/L，稀土（La^3＋）添加剂0．5-1．5#L，温度为55℃，电流密度为8～10A／dm^2，电镀时间3h。此工艺条件下所得镀层光亮，色泽好，厚度可达100μm，且镀层耐蚀性好，结合力高。A chromium coating with thickness of 100μm was electrodeposited on adulterate tungsten filament. The temperature, current density, deposition time, corrosion resistance, adhesion of the chromium coating was studied. The result shows that when CrO3 concentration is 150 -180g/L, H2SO4 is 1.5 -1.8g/L, rare earth（ La^3＋ ） additives is 0.5 -1.5g/L, temperature of the plating liquid is 55℃, current density is 8 - 10 A/dm^2, deposit time gets 3 hours, thickness of chromium coating can get 100μm, plating is brightness and fine eolour and texture. And the chromium coating has good adhesion and corrosion resistance.

关 键 词：电沉积 铬 掺杂钨丝 工艺参数 耐蚀性 CASS试验 

分 类 号：TQ153.1[化学工程—电化学工业]