图案化金属铜纳米线阵列的制备与表征  

Fabrication and characterization of patterned of copper nanowire arrays

作　　者：李晓茹[1] 宋国君[1] 彭智[1] 李培栋[1] 佘希林[1] 李建江[1] 孙瑾[1] 

机构地区：[1]青岛大学化学化工与环境学院,山东青岛266071

出　　处：《功能材料》2009年第12期2068-2070,共3页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(50473012);山东省自然科学基金资助项目(Z2005F03)

摘　　要：采用紫外线光刻技术与电化学沉积相结合的方法,成功制备了不同图案的铜纳米线阵列:一种是圆形图案;另一种是QDU图案。首先利用紫外线光刻技术在多孔阳极氧化铝模板(AAO)生成预设图案,以此作为"二次模板";再利用电化学方法将铜纳米线沉积到"二次模板"的开孔中。扫描电镜(SEM)测试结果表明,大面积、高规整的铜纳米线图案阵列各自独立地立在基底上,同时,用电子能谱(EDS)分析了铜纳米线的化学成分。透射电镜(TEM)也探测到了铜纳米线的微结构。Two different patterns, one being circular and the other being QDU, of copper （Cu） nanowire arrays were successfully produced with designed anodic aluminum oxide （AAO） templates. AAO template was first patterned using photolithography, and then Cu nanowires were electrochemically deposited into the open pores in desired area of the patterned template. The highly-ordered patterns of Cu nanowire arrays were observed to stand freely on the substrate using scanning electron microscopy （SEM）. Chemical analyses have been performed on Cu nanowires using energy dispersive X-ray spectroscopy （EDS）. The structure and mierostrueture of an individual Cu nanowire were characterized by translation electron microscopy （TEM）. The relationship between deposition time and length of wires is discussed.

关 键 词：紫外光刻法 AAO模板 图案 纳米线阵列 电沉积 

分 类 号：TB383[一般工业技术—材料科学与工程]