TiO_2介孔薄膜的制备及紫外光电响应性质  

Preparation and Ultraviolet Photoelectric Response of TiO_2 Mesoporous Thin Films

作　　者：木锐[1] 戴树玺[1] 程纲[1] 武艳强[1] 张兴堂[1] 杜祖亮[1] 

机构地区：[1]河南大学特种功能材料教育部重点实验室,开封475004

出　　处：《高等学校化学学报》2009年第12期2344-2348,共5页Chemical Journal of Chinese Universities

基　　金：国家自然科学基金(批准号:90306010;10874040);河南省教育厅自然科学基金(批准号:2009A140001)资助

摘　　要：采用蒸发诱导自组装法制备了高度有序的TiO2介孔薄膜.利用X射线衍射(XRD)、扫描电子显微镜(SEM)和透射电子显微镜(TEM)等分析手段对其进行了表征.结果表明,所得样品的孔径约为5nm,孔道规则,且骨架为纯锐钛矿结构.紫外-可见光谱(UV-Vis)的表征结果表明,制备的TiO2介孔薄膜对波长小于380nm的紫外线有很强的吸收.对TiO2介孔薄膜的I-V(电流-电压)特性进行了表征,发现加光后其I-V曲线由暗态时的肖特基特性转变为欧姆特性,表明TiO2介孔薄膜对紫外光有很敏感的光电响应.Highly orderded TiO2 mesoporous thin films were synthesized through evaporation induced self- assembly（EISA）. The as-synthesized samples were characterized by X-ray diffraction （XRD）, scanning elec- tron microscope（SEM）, and transmission electron microscope（TEM）. The results show that the mesoporous sample has a highly organized and nanocrystaline anatase framework with pore size of about 5 nm. The UV-Vis spectra reveal that TiO2 mesoporous thin films have strong absorbance to UV light（A 〈380 nm）. The I-V（cur- rent-voltage） properties of TiO2 mesopomus thin films were characterized. The results show that the I-V characteristics have changed when UV light is on and off, which indicate that TiO2 mesoporous thin films have sensitive ultraviolet photoelectric response.

关 键 词：TiO2介孔薄膜 电流-电压特性 紫外光电响应 

分 类 号：O614.41[理学—无机化学] O472[理学—化学]