双缝干涉演示图样的理论分析  

Theoretical Analysis of Interfereence of Young's Double-slit Demonstration Graph

作　　者：臧淑杰[1] 韩长虹[1] 

机构地区：[1]大连轻工业学院基础部

出　　处：《大连轻工业学院学报》1998年第3期86-90,共5页Journal of Dalian Institute of Light Industry

摘　　要：根据对单色光的双缝干涉、单缝衍射规律计算两者迭加结果，给出了双缝干涉演示实验干涉图样的正确分析。实验得出：尽可能减小缝宽，适当增加缝的间距，便能达到最佳的演示效果。According to the laws of monochromatic light's interference of young's double-slitand sigle slit diffraction,we can calculate the superposition of both waves and analysis of the demonstrating experiment graph of interference of Young's double slit.It is concluded that the most effective demonstration result can be acquired if we decrease the slit width as small as possible and increase the interval between the slits properly.

关 键 词：双缝干涉 单缝衍射 演示实验 单色光 光学 

分 类 号：O436.1[机械工程—光学工程]