记录方式对光致聚合物中全息光栅形成过程的影响  

The Effects of Recording Modes to the Formation of Holographic Grating in Photopolymer

作　　者：张韬[1] 陶世荃 翟千里[1] 宋伟[1] 

机构地区：[1]北京工业大学应用数理学院,北京100124

出　　处：《光子学报》2009年第12期3209-3213,共5页Acta Photonica Sinica

基　　金：国家自然科学基金(60477004);北京市自然科学基金(4071001)资助

摘　　要：根据光致聚合物记录机理,研究了不同记录方式对光栅衍射效率的影响.对已有的光致聚合物光栅形成的一阶扩散模型进行简化,求解出全息曝光、暗增长、均匀后曝光过程对应的折射率调制度的解析式.应用所得解析结果,对三种记录方式在不同光强下的折射率调制度动态进行数值模拟.采用蓝敏光致聚合物,分别在4mW/cm2和2mW/cm2光强下应用不同方式记录光栅,结果表明:如果曝光光强较高,暗增长的记录方式将获得相对高的饱和折射率调制度,而均匀后曝光会加速达到饱和的进程.Based on the recording mechanism of photopolymer,the effect of different recording modes on the diffraction efficiency of gratings was investigated. The existing first-harmonic diffusion model of grating formation in photopolymer was simplified,then the analytic expressions of refractive index modulation for holographic exposure, dark enhancement and uniform post-exposure were educed. The kinetics of refractive index modulation for these three recording modes under different exposure intensities were numerically simulated by using the analytic expressions. Experiments were done in a new blue-sensitized photopolymer material. The gratings were recorded by different recording modes with exposure intensities of 4 mW/cm2 and 2 mW/cm2 respectively. The results showed that if the intensity was high,the dark enhancement mode yielded to a high saturated refractive index modulation, while uniform post-exposure made the course of saturation fast.

关 键 词：全息存储 光致聚合物 全息光栅 

分 类 号：O438.1[机械工程—光学工程]