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机构地区:[1]西安理工大学理学院应用物理系,西安710048 [2]华南农业大学理学院应用物理系,广州510642
出 处:《光子学报》2009年第12期3250-3255,共6页Acta Photonica Sinica
基 金:国家自然科学基金(50977079)资助
摘 要:为了研究植物叶片光子辐射与氧化胁迫的关系,将鹅掌木叶片用不同浓度的H2O2进行了处理,从而形成氧化胁迫.实验结果表明,随着H2O2处理时间的延长,浓度为7.5%、15%和30%的H2O2处理均使鹅掌木叶片光子辐射中的自发发光较未受处理的对照有明显增长,各处理组叶片的延迟发光动力学曲线均呈现双曲性弛豫.通过建立延迟发光非线性动力学方程和数学模拟,得到了延迟发光的特征参量初始光子数I0、相干时间τ和衰减参量β,发现随着H2O2处理时间的延长,各处理组叶片的I0都呈现先下降,后回升,再下降的波动趋势;而浓度为7.5%和15%的两个处理组的叶片τ值和β值呈现波动变化,浓度为30%的处理组的叶片τ和β呈现单调下降的趋势.推测H2O2胁迫下叶片光子辐射中自发发光的变化反映了叶片活性氧含量的变化;叶片延迟发光中I0的变化反映了细胞总体代谢的变化,延迟发光中的τ值和β值的变化反映了叶片细胞对H2O2胁迫的适应和损伤过程.In order to study the relationship between biophoton emission of plant leaf and oxidative stress, the leaf of plant(Schefflera)is treated with different concentration H202 solution. The experimental result indicates that along with the time of leaf treated with the concentration 7. 5%, 15% and 30% H2Oe extension,spontaneous biophoton emission (BPE) of biophoton emission in leaf increased obviously compared with the control that the leaf had not treated with H202 solution, and the dynamics curves of delayed luminescence(DL) in leaf showed hyperbolic relaxation. Through the establishment of non-linear dynamics equation about DL and the mathematical simulation,the initial photon number I0 ,coherence time τ and weaken parameter β about DL are obtained. The analysis results discover that along with the time of leaf treated with He 02 extension,initial photon number Io of various treatment groups droped first,latter rose,then dropped again, but the values of coherence time r and weaken parameter β of two treatment groups about 7.5% and 15% H2 02 stress presented fluctuation change, the values of τ and β of treatment group about 30% H202 stress presented the monotonous drop tendency. We extrapolated that the change of BPE had reflected the change of active oxygen content in cell under H202 stress, the change of initial photon number I0 of DL had reflected overall metabolism's change in cell,the changes of τ and β about DL had reflected the adaptation and damage process about cell to H2 02 stress.
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