Amorphous forming ability of Co-X(X=Cr,Mo,W) magnetic thin films  

作　　者：Gaowu QIN Na XIAO Bo YANG Yuping REN Wenli PEI Xiang ZHAO 

机构地区：[1]Key Laboratory for Anisotropy and Texture of Materials （Ministry of Education）, Northeastern University, Shenyang 110004, China

出　　处：《Acta Metallurgica Sinica(English Letters)》2009年第6期415-420,共6页金属学报（英文版）

基　　金：supported by National Natural Science Foundation of China(No.50671020);Program for Changjiang Scholars and Innovative Research Team in University (No.IRT0713)

摘　　要：Co-X （X=Cr, Mo, W） magnetic thin films were prepared by using DC magnetron sputtering, and their structures were examined by using X-ray diffraction （XRD）. The amorphous forming ability （AFA） of the three alloy systems was discussed based on thermodynamic calculation and experiments. The results show that the Co-Mo thin films exhibit the largest AFA among them, and the Co-W thin films are conditiondependent amorphous while the Co-Cr thin films are hard to be amorphous, which is consistent with the thermodynamic calculation. The difference in AFA for the alloys of these three systems is finally ascribed to three main factors： differences in electronegativity, electron density and atomic size between Co and X elements.Co-X （X=Cr, Mo, W） magnetic thin films were prepared by using DC magnetron sputtering, and their structures were examined by using X-ray diffraction （XRD）. The amorphous forming ability （AFA） of the three alloy systems was discussed based on thermodynamic calculation and experiments. The results show that the Co-Mo thin films exhibit the largest AFA among them, and the Co-W thin films are conditiondependent amorphous while the Co-Cr thin films are hard to be amorphous, which is consistent with the thermodynamic calculation. The difference in AFA for the alloys of these three systems is finally ascribed to three main factors： differences in electronegativity, electron density and atomic size between Co and X elements.

关 键 词：Amorphous forming ability CO-CR CO-MO Co-W 

分 类 号：O484.43[理学—固体物理] TG139.8[理学—物理]