Ti-Si-Al-N纳米复合膜的组织与性能  

Microstructure and properties of Ti-Si-Al-N nano-composite films

作　　者：李学梅[1] 尤建飞[1] 董松涛[1] 汪蕾[1] 许俊华[1] 

机构地区：[1]江苏科技大学材料学院先进焊接技术重点实验室,江苏镇江212003

出　　处：《材料热处理学报》2009年第6期144-148,共5页Transactions of Materials and Heat Treatment

基　　金：国家自然科学基金资助项目(50574044)

摘　　要：采用磁控反应溅射法制备了一系列Al含量不同的Ti-Si-Al-N纳米复合薄膜,采用X射线衍射仪、扫描电子显微镜及配套能量色散谱仪研究了Al含量对薄膜组织结构、硬度及高温抗氧化性的影响。结果表明:Ti-Si-Al-N薄膜点阵常数随Al含量的增加呈下降趋势;Al含量增加到6.48at%时出现h-AlN相,此时薄膜具有最高的硬度,约33GPa;薄膜的抗氧化温度提高到约900℃,但Al含量较高易导致薄膜晶粒在高温下长大。Ti-Si-Al-N nano-composite films with different Al content were fabricated by reactive magnetron sputtering technique.The microstructure and properties of these films were investigated by means of X-ray diffraction,scan electron microscopy and energy dispersive spectrum analysis.The results show that with increasing of Al content,the lattice parameter of the composite films decreases. As the Al content increases up to 6.48 at%,h-AlN phase forms,and the films get the maximum microhardness of 33GPa.Oxidation temperature of the composite films increases to 900℃ with the addition of Al,however,the higher Al content may lead to grain growth of the films at high temperature.

关 键 词：Ti-Si-Al-N复合膜 显微硬度 高温抗氧化性 磁控反应溅射法 

分 类 号：TG174.44[金属学及工艺—金属表面处理]