非平衡磁控溅射掺Cr类石墨镀层的结构分析  

Analysis of Structure of Cr-doped GLC Coatings Deposited by Unbalanced Magnetron Sputtering

作　　者：严少平[1,2] 蒋百灵[2] 张永宏[2] 陈迪春[2] 李洪涛[2] 

机构地区：[1]安徽理工大学理学院,安徽淮南232001 [2]西安理工大学材料科学与工程学院,陕西西安710048

出　　处：《安徽理工大学学报（自然科学版）》2009年第4期71-76,共6页Journal of Anhui University of Science and Technology:Natural Science

基　　金：安徽省教育厅自然科学基金资助项目(2005kj034zd);国家863科技攻关项目(2005AA33H010)

摘　　要：采用非平衡磁控溅射离子镀技术,通过调节Cr靶的溅射功率,在单晶硅基片上沉积制备了一系列不同Cr含量的类石墨(Cr-GLC)镀层样品。利用Raman光谱仪、X射线光电子能谱(XPS)、透射电子电镜(TEM)、显微硬度计分析了Cr-GLC的微观结构和显微硬度。结果表明,利用非平衡磁控溅射得到的Cr-GLC镀层,随Cr含量的增高,硬度逐渐降低并趋于稳定。当Cr含量小于4%时,Cr只以单质非晶态分布于非晶GLC中,Cr的掺杂降低了内应力;当Cr含量超过4%后,还有CrC_X纳米晶存在于非晶态的GLC中;镀层由C、Cr和CrC_X纳米晶粒组成非晶结构。A series of samples with different Cr concentration of Cr-doped GLC coatings deposited on single crystal silicon substrates by unbalanced magnetron sputtering ion plating technique were prepared by adjusting sputtering power of Chromium target. Microstructure of Cr-GLC coatings was investigated by Raman spectrum, X-ray photoelectron spectrometer （XPS）, transmission electronic microscope （TEM）, and microhardness was measured by microhardness tester. The results showed that hardness of Cr-GLC coatings gradually decreases with increase of Cr content and tends to a stable value. Chromium noncrystals occur in amorphous GLC coatings when Cr content is below 4%, and chromium doping results in inner stress decrease. CrCxnanocrystals also occur in amorphous GLC coatings when Cr content is above 4%. The amorphous coatings are composed of C, Cr and CrCxnanocrystals.

关 键 词：类石墨镀层 微观结构 显微硬度 

分 类 号：TB383[一般工业技术—材料科学与工程]