亚微米级孔径微弧氧化膜层工艺研究  

Microarc Oxidation Coating of the Sub-Micron Holes

作　　者：潘明强[1] 狄士春[1] 迟关心[1] 韦东波[1] 

机构地区：[1]哈尔滨工业大学,黑龙江哈尔滨150001

出　　处：《稀有金属材料与工程》2009年第A02期556-559,共4页Rare Metal Materials and Engineering

摘　　要：在其他加工参数固定的条件下,对LD10铝合金试件进行处理,然后采用扫描电镜对膜层表面显微结构进行观测分析,研究由KOH、KF、Na2SiO3、(NaPO3)6构成的溶液中各种成分浓度的变化对膜层表面放电孔径的影响。结果表明:KOH浓度变化对膜层孔径影响最小;随着Na2SiO3浓度的增加,膜层放电孔径先减小后快速增加;而增加KF和(NaPO3)6的浓度时,膜层孔径都会逐渐减小,最后趋向一个最小值。实验表明:调整好上述溶液的配比,可在试样表面获得最小放电孔径为350nm的微弧氧化膜层。Under other constant processing parameters condition, LD10 aluminum alloys were treated and then the scanning electron microscope was used to observe the mierostructure of the coating surface; finally the influence of each kind of solution composition on the electric discharge aperture in solution which consists of KOH, Na2SiO3, KF and （NaPO3）6 were researched. The result indicates that the change of KOH concentration has the smallest influence on the discharge aperture. With increasing the Na2SiO3 concentration, the discharge aperture decreases firstly, and then increases fast. When the concentration of the KF and （NaPO3）6 is increasing, the discharge aperture continues to reduce. After reaching a certain value, their influence on the discharge aperture is very small. Adjusting the above solution proportion, the microare oxidation coating can be obtained whose smallest discharge aperture is 350 nm.

关 键 词：放电孔径 微弧氧化 膜层 

分 类 号：TG174.451[金属学及工艺—金属表面处理]