卤素原子在化学气相淀积金刚石薄膜过程中的作用  

The Functions of Halogen in CVD Diamond Thin Film Deposition Process

作　　者：刘志杰[1] 张卫[1] 万永中[1] 王季陶[1] 

机构地区：[1]复旦大学电子工程系CVD研究室

出　　处：《高技术通讯》1998年第6期43-46,共4页Chinese High Technology Letters

基　　金：863计划;国家自然科学基金

摘　　要：根据非平衡热力学耦合模型计算得到了碳氢氟和碳氢氯体系低压金刚石生长的非平衡定态相图，计算结果与大量实验事实符合良好，可以为实验研究提供理论指导。还详细讨论了卤素原子在金刚石薄膜淀积过程中的作用。Non equilibrium stationary phase diagrams for C H F and C H Cl system diamond growth are calculated based on the non equilibrium thermodynamic coupling model. The phase diagrams coordinate well with quantities of experimental results published in recent years, therefore can guide the experimental research on diamond growth. Also, the functions of halogen atoms in CVD diamond deposition process are discussed in detail in this paper.

关 键 词：卤素 化学气相淀积 金刚石 薄膜 非平衡热力学 

分 类 号：TN304.18[电子电信—物理电子学] TN304.055