不同背景气体下非平衡等离子体去除NO实验  

NO removal by a non-equilibrium plasma with different background gases

作　　者：孙保民[1] 尹水娥[1] 孙红华[1] 周志培[1] 高旭东[1] 张扬[1] 李飞[1] 

机构地区：[1]华北电力大学电站设备状态监测与控制教育部重点实验室,北京102206

出　　处：《环境科学学报》2010年第1期66-71,共6页Acta Scientiae Circumstantiae

基　　金：北京市教育委员会共建项目专项资助~~

摘　　要：设计了一套高压电源和柱-筒反应器装置,在不同的背景气体下进行了介质阻挡放电脱硝的实验研究,主要探讨了放电电压、含氧量、停留时间和功率对NO去除率的影响.结果表明:不同背景气体下,放电电压在一定的范围内(氩气:5～7kV;氮气:9～11kV)对NO脱除率有较大影响;氧气的加入对不同背景气体下的脱硝率都有影响,对氩气背景下的NO去除率影响最大;停留时间的增加有利于NO的去除,当停留时间增加到某一个值(7s)后,NO的去除率变化逐渐平缓;达到相同的去除率,氩气背景下的功率远远小于氮气背景,功率的增加有利于NO的去除;合理选择背景气体有利于NO去除率的提高和能耗的降低.A testing rig composed of high voltage power and coaxial cylinder-tube dielectric barrier discharge reaction vessel was designed to study NO removal with a non-thermal plasma using different background gases. The influences of applied voltage, ratio of O2, residence time and discharge power on NO removal rate were also investigated. According to the experimental results, the NO removal rate increases remarkably with discharge voltage within a certain range （Ar：5～7 kV;N2：9～11 kV） in the different background gases. The presence of O2 leads to a decreasing removal rate of NO when the background gases are Ar and N2, and this impact becomes more significant when only Ar is used. An increase in residence time could facilitate NO removal, while this effect is weakened when the residence time reaches a limit value, e.g. 7 s. To achieve the same NO removal rates, the discharge power needed in an Ar background is far less than that in a N2 background, although the NO removal rate could generally be promoted by increasing power input. Keeping other conditions constant, the NO removal rate and correspondent energy consumption could be optimized by reasonable selection of ratios of background gases.

关 键 词：背景气体 介质阻挡放电 NO去除率 

分 类 号：X701.3[环境科学与工程—环境工程]