Nikon步进重复光刻机的对位机制  

Alignment Mechanism of Nikon Step and Repeat Machine

作　　者：陈德鹅[1] 吴志明[1] 王军[1] 袁凯[1] 何峰[1] 蒋亚东[1] 

机构地区：[1]电子科技大学光电信息学院电子薄膜与集成器件国家重点实验室,成都610054

出　　处：《微处理机》2009年第6期1-3,7,共4页Microprocessors

摘　　要：具体探讨了Nikon步进重复光刻机掩膜版和硅片的对位过程及硅片对位结果的检测方法。分析了硅片对位过程中产生的对偏现象,用EGA算法对对偏进行计算和补偿,同时探讨了对偏产生的原因及对应的处理方法,给掩膜—硅片的对位过程中出现的问题提供了解决方案。Reticle and wafer aligning process of Nikon Step and Repeat machine were concretely investigated, including detection of wafer alignment. The misalignment phenomenon of wafer alignment is analysed too, then calculated and compensated for misalignment by EGA algorithm, meanwhile, the reason and relative processing method of misalignment is investigated, which offer solutions to the oroblems on reticle and wafer alignment.

关 键 词：光刻 硅片对位 对偏 算法 

分 类 号：TN305.7[电子电信—物理电子学]