^(16)O 弹性前冲测量氦的深度分布  

DEPTH PROFILING OF IMPLANTED HELIUM BY 16 O ELASTIC RECOIL DETECTION

作　　者：魏澎[1] 赵国庆[1] 周筑颖[1] 施立群[1] 杨福家[1] 向伟[2] 罗四潍 

机构地区：[1]复旦大学现代物理研究所 [2]中国工程物理研究院应用电子学研究所

出　　处：《原子能科学技术》1998年第5期385-390,共6页Atomic Energy Science and Technology

摘　　要：利用１２ＭｅＶ的１６Ｏ离子弹性前冲测量（ＥＲＤ）方法，研究了以２０ｋｅＶ和４０ｋｅＶ注入４Ｈｅ的镀钛样品。通过分析ＥＲＤ能谱，得到了注入４Ｈｅ的深度分布，并与非卢瑟福背散射结果进行了比较。对４０ｋｅＶ注入的样品观察到有双峰分布，２０ｋｅＶ注入的样品没有双峰分布，实验结果与ＴＲＩＭ模拟计算结果进行了比较。MeV 16 O ions are used for profile of 4He by elastic recoil detection (ERD).The sample is titanium deposited by vapor on Mo substrate. Helium is introduced in it by 20 and 40 keV implantation. The depth profile of ERD is compared with that of proton non rutherford backscattering (PBS).The double peak profile is found in the sample with 40 keV implantation,but no such profile in the sample with 20 keV implantation. The results are compared with TRIM95 calculation.

关 键 词：弹性前冲测量 深度分布 氦4 氧6 

分 类 号：O571.1[理学—粒子物理与原子核物理] O613.11[理学—物理]