溶液中表面活性剂临界胶束浓度降低措施的研究进展  

Research progress in processes for lowing critical micelle concentration during surfactant-enhanced aquifer-remediation

作　　者：吴耀国[1] 李建国[1] 刘保超[1] 胡思海[1] 

机构地区：[1]西北工业大学应用化学系,陕西西安710072

出　　处：《现代化工》2010年第1期25-29,共5页Modern Chemical Industry

基　　金：国家自然科学基金项目(40872164;40472127);教育部"新世纪优秀人才支持计划"项目(NCET-07-0694)

摘　　要：表面活性剂增效技术是近期发展起来并被认为是可对污染地下水进行有效修复的技术之一,但为避免引起新的污染,需控制其投放剂量。综述了通过表面活性剂的优化匹配及水化学组分调节等方式降低表面活性剂的临界胶束浓度,进而实现减少表面活性剂投放量的研究进展,指出其存在的问题,展望其发展前景。Surfactant-enhanced aquifer-remediation is promoted in recent years and considered as one effective method for aquifer-remediation. However, the dose of surfactant needs to be controlled to avoid new contamination. The researches on removing the obstacle through surfactants＇ optimum and chemical components adjustment are reviewed. At the same time, some problems in current studies and issues that need to be further approached are presented.

关 键 词：表面活性剂增效技术 表面活性剂 临界胶束浓度(CMC) 化学组分 

分 类 号：TQ423[化学工程]