曝光量对DCG中Cr2P_(3/2)XPS谱的影响的研究  

A Study on the Effect of Exposure on Cr2P_(3/2) X-ray Photoelectron Spectroscopy in DCG

作　　者：熊良文[1] 哈流柱[2] 彭必先[1] 

机构地区：[1]中国科学院感光化学研究所,北京100101 [2]北京理工大学工程光学系,北京100081

出　　处：《功能材料》1998年第5期539-542,共4页Journal of Functional Materials

摘　　要：通过对不同曝光量的重铬酸盐明胶(DCG)中的Cr2P3／2XPS（X射线光电子能谱）的规定发现，Cr2P3／2XPS谱随曝光量呈规律性的变化：在0～195mJ／cm2曝光量范围内，它的1／5高宽度（FWFM，即：thefullwidthatfifthmaximum）和576．4eV附近的峰的相对强度先随曝光量增加而增大，到达极大值后又随曝光量的增加而减小；相反，它的579．4eV和577．4eV附近的两个峰的相时强度却是先随曝光量的增加而减小，达到极小值后又随曝光量的增加而增大。对这些不同曝光量的DCG膜定性地水洗处理后，曝光量为130mJ/cm2的全息图最均匀、明亮；曝光量为195mJ／cm2的全息图衍射效率很低，且有残余黄褐色。根据这些实验结果和固态膜反应的特点，就曝先对DCG微观结构引起的变化作了分析，确定出了贡献各峰的化合物状态并科学准确地找到了Cr2P3／2XPS谱随曝光量成规律性变化的本质原因是作为潜影中心的二氧化铬（576．4eV附近的铬）严格地受曝光量的制约。这个结论的得出，为制作理想的全息图选择合适的曝光量提供了理论依据。即：576．4eV附近的峰有最大相对强度的曝光量为最佳曝光量。In this paper, the Cr2P3/2 X-ray photoelectron spectroscopy (XPS) of different exposed dichromate gelatin (DCG) was studied. It was found that the spectrum of Cr2P3/2XPS changes with exposure regular. When the exposure was between 0 and 195mJ/cm2, the full width at fifth maximum (FWFM) of spectrum of Cr2P3/2XPS and the relative intensity of the peak nearby 576. 4eV increased first with the augment of exposure, reached a maximum at about 120mJ/cm2, and then decreased with the increase of exposure, while the change tendencies of the relative intensities of the peak nearby 579. 4eV and the peak nearby 577. 4eV were just contrary to that of the peak nearby 576. 4eV. When these DCG films which were differently exposed were processed qualitatively, it was found that the hologram with exposure of 130mJ/cm2 was the brightest and the hologram with exposure of 195mJ/cm2 was yellowish. According to these experiment results and the reaction characteristics in solid film, we draw an inference that the effect of light quantum on DCG and determined the states of the chromiums which contributed the peaks. Through the current experiment, the theoretical basis for selecting moderate exposure was found. That is, the exposure which make the biggest relative intensity of the peak nearby 576. 40eV is the optimum exposure.

关 键 词：全息图 重络酸盐明胶 XPS 曝光量 DCG 

分 类 号：TB877[一般工业技术—摄影技术]