石墨靶材电流对Ti(C,N)多层膜微观组织及力学性能的影响  

Effects of Graphite Target Current on Microstructure and Mechanical Properties of Ti(C,N) Multilayer Film

作　　者：李斌[1,2] 张国君[1] 蒋百灵[1] 陈迪春[1] 严富学[1] 

机构地区：[1]西安理工大学材料科学与工程学院,陕西西安710048 [2]西安交通大学材料科学与工程学院,陕西西安710049

出　　处：《西安理工大学学报》2009年第4期455-459,共5页Journal of Xi'an University of Technology

基　　金：国家高技术研究发展计划(863计划)资助项目(2005AA33H010)

摘　　要：采用反应非平衡磁控溅射技术制备了Ti(C,N)多层膜,其中以石墨靶材作为镀层生长所需的碳源。实验研究了石墨靶材电流变化对Ti(C,N)多层膜微观组织、力学性能以及摩擦性能的影响。采用X射线衍射仪及透射电子显微镜观察分析了多层膜的相组成与微观组织;使用维氏显微硬度计及销盘试验机分别测试了多层膜的显微硬度与摩擦系数。研究结果表明,所制备的Ti(C,N)镀层不仅具有多层结构而且镀层内还存在大量的纳米柱状晶粒。Ti(C,N)镀层内晶粒尺寸随石墨靶材电流的增加而逐渐减小而多层周期厚度随着石墨靶材电流的增加而增大。镀层的多层结构强烈抑制Ti(C,N)柱状晶的生长,当石墨靶材电流增加时,Ti(C,N)镀层内细小的柱状晶逐渐消失并出现非晶相。The Ti（C,N） films have been prepared successfully by means of reactive unbalanced magnetron sputtering technology,of which the graphite target is used as the C supplier.The experiments are conducted to study the effects of electric current changes in graphite target upon microstructure,mechanical properties and friction performances of Ti（C,N） multilayer films.X-ray diffraction and transmission electron microscopy are adopted to analyze the phase components and microstructure of multilayer films.A digital microhardness tester and a pin-on-disk tester are employed to test the microhardness and the friction coefficient of multilayer films.The research results indicate that the Ti（C,N） films exhibit not only the multilayer structure but also the existing nanocolumnar grains in the prepared films.The grain sizes of Ti（C,N） films gradually decrease as the graphite target current increases,and the periodic thickness of multilayer films increases along with the rising of graphite target current.The columnar growth of Ti（C,N） is strongly suppressed by the multilayer structure.A clear microstructure transition of Ti（C,N） film can be seen that the fine columnar grains gradually disappear as the amorphous phase appears during the graphite target current increases.

关 键 词：TI(C N) 多层膜 石墨靶材 

分 类 号：TG174.444[金属学及工艺—金属表面处理]