基于单片机的脉冲电镀电源设计  

Design of Pulse Electroplate Power Supply Based on Single-chip

作　　者：李长诗[1] 陈冬丽[1] 王素梅[1] 

机构地区：[1]郑州轻工业学院机电工程学院,郑州450002

出　　处：《煤矿机械》2010年第2期184-186,共3页Coal Mine Machinery

摘　　要：脉冲电镀电源是近年来电镀电源发展的方向。以我院化工系镀铝实验为课题背景,设计了脉冲电镀电源硬件电路。详细给出了主电路、控制电路、保护电路的设计。实验结果表明该脉冲电镀电源具有工作稳定性好、稳压稳流精度高和上镀时间快等优点,而且电镀效果良好,作为电镀电源可广泛应用于其他金属电镀电源。Pulse eleetroplating power supply is the direction of development of electroplate power supply in recent years. The hardware circuit about pulse electroplating power is designed on the background of aluminizing experimental for the department of chemical engineering of our college. Displays the designs of the main circuit, control circuit and protection circuit in detail. The experimental results show that the pulse plating power supplies have the advantages of good working stability , good controlling precision short plating time and plating well. It can be widely applied to other metal plating power as electroplating power.

关 键 词：电镀电源 整流滤波 IGBT管 STC12C5412AD单片机 

分 类 号：TP39[自动化与计算机技术—计算机应用技术]