Electrochemical deposition of aluminum on W electrode from AlCl_3-NaCl melts  

作　　者：阚洪敏 王兆文 王晓阳 张宁 

机构地区：[1]Key Laboratory of Advanced Materials Preparation Technology of Liaoning Province, Shenyang University [2]School of Materials and Metallurgy, North eastern University

出　　处：《中国有色金属学会会刊：英文版》2010年第1期158-164,共7页Transactions of Nonferrous Metals Society of China

基　　金：Project(50672060) supported by the National Natural Science Foundation of China;Project(2007CB210305) supported by the National Basic Research Program of China

摘　　要：Electrochemical deposition of aluminum on W electrode from AlCl3-NaCl melts was studied by cyclic voltammetry and chronopotentiometry. The results show that Al ( Ⅲ) is reduced in two consecutive steps, i.e., 4Al2Cl7-+3e-→Al+7AlCl4- and then AlCl4-+3e-→Al+4Cl-. The electrochemical reaction of 4Al2Cl7-+3e-→Al+7AlCl4- is reversible. Certain nucleation overpotential is required during the deposition of aluminum on W electrode. Chronopotentiometry analysis also shows that Al (Ⅲ ) is reduced in two consecutive steps under certain current density, which is in reasonable agreement with cyclic voltammograms. By using constant current deposition, the electrodeposits on Al substrate obtained at between 50 and 100 mA/cm2 are quite dense and well adherent to the Al substrate. The electrochemical deposition of aluminum on Cu substrate in AlCl3-NaCl melts indicates that the intermetallic compounds are formed. The intermetallic compounds are AlCu and Al2Cu.Electrochemical deposition of aluminum on W electrode from AlCl3-NaCl melts was studied by cyclic voltammetry and chronopotentiometry. The results show that Al （III） is reduced in two consecutive steps, i.e., 4Al2Cl7-＋3e^-→Al＋7AIC14- and then AlCl4^-＋3e^-→Al＋4Cl^-. The electrochemical reaction of 4Al2Cl7^-＋3e^-→Al＋7AlCl4^- is reversible. Certain nucleation overpotential is required during the deposition of aluminum on W electrode. Chronopotentiometry analysis also shows that Al （Ⅲ） is reduced in two consecutive steps under certain current density, which is in reasonable agreement with cyclic voltammograms. By using constant current deposition, the electrodeposits on Al substrate obtained at between 50 and 100 mA/cm^2 are quite dense and well adherent to the Al substrate. The electrochemical deposition of aluminum on Cu substrate in AlCl3-NaCl melts indicates that the intermetallic compounds are formed. The intermetallic compounds are AlCu and Al2Cu.

关 键 词：电化学沉积 三氯化铝 氯化钠 铝电极 融化 金属间化合物 计时电位法 循环伏安法 

分 类 号：TF821[冶金工程—有色金属冶金]