脉冲电晕放电中OH自由基的发射光谱研究  

Study of Emission Spectroscopy of OH Radicals in Pulsed Corona Discharge

作　　者：魏波[1] 骆仲泱 徐飞[1] 赵磊[1] 高翔[1] 岑可法[1] 

机构地区：[1]浙江大学能源清洁利用国家重点实验室,浙江杭州310027

出　　处：《光谱学与光谱分析》2010年第2期293-296,共4页Spectroscopy and Spectral Analysis

基　　金：国家高技术研究发展计划"863"项目(2007AA061804)资助

摘　　要：采用发射光谱法测量了在加湿的空气、氮气、氩气3种气体背景下脉冲电晕放电产生的OH自由基,通过对发射谱线的分析,研究了在3种背景条件下,脉冲峰值电压、脉冲频率等因素对OH自由基产生过程的影响,着重研究了气体湿度对OH自由基产生过程的影响以及OH自由基在放电电场中的分布特性。实验表明OH自由基的生成量随脉冲峰值电压和脉冲频率的增大而增大,而湿度变化对其影响则与放电背景环境有关,不同背景气体下其变化规律也不相同。空气中放电时产生的OH自由基数量随湿度的增大而增大,氮气中OH自由基的生成量随湿度增大呈先增大后减小趋势,而氩气中OH自由基数量随湿度的增大呈先减少后增大趋势。OH自由基在放电电场中的分布呈从针电极中心向四周逐渐减少趋势。In the present paper, OH radicals generated by pulsed corona discharge in humidified air, N2 and Ar in a needle-plate reactor were measured by emission spectra. With the analysis of the emission spectra, the influence of pulse peak voltage and frequency on OH radical generation was investigated in the three kinds of background gases. The influence of the gas humidity on the generation and the distribution of OH radicals in the electric field was also discussed in detail. The authors studied the in- fluence of the gas humidity on the generation of OH radicals in the electric field by the control of accurate change in humidity, and we also studied the distribution of OH radicals in the electric field in different background gases including humidified air, Nz and Ar by the accurate change in scales. The experiment shows that the output of OH radicals grows as the pulse peak voltage and frequency grow, but the influence of gas humidity on the process of generating OH radicals by pulsed corona discharge de- pends on the discharge background. The rules of the generation change when the background gases change. As the humidity in the background gases grows, the amount of OH radicals grows in the air, but it grows at first and decreases at last in N2, while it decreases at first and grows at last in Ar. The distribution of OH radical shows a trend of decreasing from the needle-electrode to its circumarnbience.

关 键 词：脉冲电晕放电 OH自由基 发射光谱 气体湿度 

分 类 号：O433.1[机械工程—光学工程]