退火对大面积CdTe多晶薄膜薄膜的影响  

The effect of large scale CdTe polycrystalline film of annealing

作　　者：王文武[1] 雷智[1] 郑家贵[1] 冯良桓[1] 邓懿[1] 蔡亚萍[1] 张静全[1] 黎兵[1] 武莉莉[1] 李卫[1] 

机构地区：[1]四川大学材料科学与工程学院,成都610064

出　　处：《四川大学学报（自然科学版）》2010年第1期146-150,共5页Journal of Sichuan University(Natural Science Edition)

基　　金：863重点项目(2003AA513010);博士点基金项目(20050610024);四川省应用基础(2006J13-083)

摘　　要：对近空间升华法制备的大面积(30 × 40 cm^2)CdTe多晶薄膜用不同方法进行退火处理,用XRD、C～V、I～V等研究了退火条件,退火方式对薄膜结构和器件性能的影响.结果表明:刚沉积的CdTe多晶薄膜呈立方相,沿着(111)方向择优取,向而退火后(111)(220)(311)等峰都有不同程度的增加.在纯氧气氛下,400℃退火还出现了新峰.随着退火温度的增加,电导激活能降低.经过连续退火装置在400℃下退火30分钟的电池,1/C^2和V成线性关系,具有较高的掺杂浓度、较理想的二极管因子和较高的转换效率.Large CdTe thin films prepared by close--spaced--sublimation （CSS） technique were annealed. The effect of films＇ structure and properties by annealing was studied by XRD,C-V,I-V. The results showed that the structure of as--deposited CdTe film was cube and that （111）（220）（311） peaks increased after annealed. There appeared new peak in the sample annealed at 400℃ in oxygen. And with the temperature increasing, the activation energy decreased. The results of C-V and I-V characteristics improve that the continuous annealing fashion is suitable for manufacture. apparatus and ultrasonic spraying CdCl2 solution fashion is suitable for manufacture.

关 键 词：大面积CdTe多晶薄膜 退火 

分 类 号：O736[理学—晶体学]