微透镜列阵成像光刻调焦方法  

Zooming Method for Microlens Array Imaging Photolithography

作　　者：张为国[1,2] 董小春[1] 杜春雷[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209 [2]中国科学院研究生院,北京100039

出　　处：《光电工程》2010年第3期39-43,共5页Opto-Electronic Engineering

基　　金：863基金资助项目(2007AA03Z332)

摘　　要：本文分析了离焦量对微透镜列阵成像光刻图形质量的影响,给出了系统离焦量的容差。同时提出了一种结构简单、可应用于微透镜列阵成像光刻系统调焦的新方法。并将基于该调焦方法的实验装置应用于微透镜列阵成像光刻系统,进行了光刻实验。实验表明,利用该方法对微透镜列阵成像光刻系统调焦,可得到接近微透镜列阵极限像质的光刻图形。Defocusing effect on the patterns of microlens array imaging photolithography is analyzed, and tolerance of defocusing range of the system is given. Meanwhile, a novel method with simple structure for zooming is proposed, which is able to be used in microlens array photolithography system for zooming. Then the equipment based on adjustment focus method is applied to microlens array imaging photolithography, and experiments are carried out on the microlens array imaging system. At last, it is proved that the quality of patterns fabricated by this zooming method approaches to the optimized image quality of microlens.

关 键 词：微纳光学 成像光刻 微透镜列阵 离焦 

分 类 号：O439[机械工程—光学工程]