铀表面等离子体浸没离子注入沉积制备氮化层+Ti/TiN多层膜的结构与性能  

Microstructure and Properties of Nitriding Layer +Ti/TiN Multilayer Films on Uranium Prepared by Plasma Immersion Ion Implantation and Deposition

作　　者：黄河[1] 白彬[1] 赖新春[1] 刘天伟[1] 严东旭[1] 龙重[1] 

机构地区：[1]表面物理与化学国家重点实验室,四川绵阳621900

出　　处：《材料保护》2010年第2期64-66,共3页Materials Protection

基　　金：表面物理与化学国家重点实验室支持项目(90000460200605)

摘　　要：为了改善金属铀的摩擦磨损和抗腐蚀性能,采用等离子体浸没离子注入沉积(PIII&D)技术在铀表面氮化,再沉积Ti/TiN多层膜。利用扫描电镜和X射线衍射分析了薄膜的形貌和组织结构;对薄膜的摩擦磨损和抗湿热腐蚀性能进行了测试。结果表明:薄膜表面致密,界面晶粒柱状生长方式被阻断,晶粒细化;薄膜为Ti和TiN的双相结构,衍射谱中出现了UO2和U2N3的衍射峰;薄膜大大提高了铀基体的摩擦磨损和抗湿热腐蚀性能,调制周期对薄膜性能的影响较大。The surface of U was nitrided byplasma immersion ion implantation and deposition (PII1&D),fol-lowed by deposition of Ti/TiN mutilayer films,aiming at impro-ving the wear resistance and corrosion resistance.The morphologyand microstructure of films were analyzed by means of scanning electron microscopy and X-ray diffraction.Al the same time,the friction and wear behavior as well as humid-hot corrosion resist-ance of films were evaluated.Results show that the surface of films prepared by PⅢ&D is compact,and grains arc refined due to the interruption of their columnar growth.Diffraction peaks ofUO2 and U2N3 were observed along with Ti and TiN biphase Structure of the films.Besides,the films showed much better wear resistance and corrosion resistance than the U substrate,andthe properties were highly dependent on modulation period.

关 键 词：氮化 Ti/TiN多层膜 等离子体浸没离子注入沉积 铀 性能 

分 类 号：TG174.4[金属学及工艺—金属表面处理]