电解抛光法制备金属钨箔膜  

Preparation of tungsten foil by electropolishing

作　　者：宋萍[1,2] 邢丕峰[1] 谌家军[2] 李朝阳[1] 谢军[1] 郑凤成[1] 

机构地区：[1]中国工程物理研究院激光聚变研究中心,四川绵阳621900 [2]西华师范大学物理与电子信息学院,四川南充637900

出　　处：《强激光与粒子束》2010年第2期311-314,共4页High Power Laser and Particle Beams

基　　金：国家高技术发展计划项目

摘　　要：研究了在硫酸甲醇体系中进行电解抛光制备状态方程(EOS)靶用钨薄膜。分析了钨的阳极极化曲线,对薄膜的表面形貌、晶粒取向、密度和厚度一致性进行了测试和分析,并制备出均方根粗糙度小于50nm、厚度一致性好于99%、能够保持原材料密度的钨箔膜,满足激光驱动材料高温高压状态方程研究的标准靶材料的需求,证明电解抛光是制备低表面粗糙度、块材密度的EOS所用金属箔材的有效手段。The preparation of the tungsten foil for equation of state（EOS） target was studied by electropolishing in sulfuric acid-methanol. The anodic polarization curve of the tungsten foil was analyzed, and the surface topography, grain orientation, density and thickness uniformity were tested. The tungsten foil was prepared with high surface quality （RMS roughness less than 50 nm） and thickness uniformity beyond 99%, and could keep the density of raw materials. This foil could satisfy the requirement of laser driven materials for the research of high temperature and pressure EOS. Thus electropolishing is a significant method for preparating the foil which can fulfill the requirement of EOS target.

关 键 词：电解抛光 钨箔膜 粗糙度 厚度一致性 

分 类 号：O646.6[理学—物理化学]